Titanium tungsten sputtering targets are a versatile material employed in numerous industrial processes. Their exceptional properties, comprising high hardness, wear resistance, and low coefficient of friction, make them ideal for applications requiring durable and robust coatings. These targets seamlessly deposit thin films through physical vapor

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Sputtering is a vital technique utilized in the fabrication of advanced thin films. Titanium (Ti) sputtering, specifically, has emerged as a favorable method due to its ability to deposit high-quality Ti thin films with controlled thickness and composition. The process involves bombarding a Ti target with energetic ions, dislodging atoms that then